Chemical Waste Treatment
Feature Product: de-Peroxide - innovative removal of H2O2 in waste H2SO4
ARCADIA and our technology partner provides an enabling solution to wafer fabs. Our equipment, using our patented catalyst recipe, removes H2O2 content from 4-7% in waste H2SO4-H2O2 solution to less than 50ppm concentration. Our 5 and 10 CMD (cubic meters per day) equipment model has been successfully deployed in over 10 mass volume production wafer fabs.
Advantages:
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Environmental green and friendly
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de-H2O2 equipment meets and exceeds transportation regulation after reduction of H2O2 content
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Reduce risk and cost in transporting untreated, explosive waste H2SO-H2O2 to reclaim / re-process facility
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de-H2O2 equipment is low energy consumption (unlike distillation)
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Small footprint
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Capable of further diluting to desired H2SO4 concentration after reduction of H2O2 content
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No Cl2 nor metallic contribution in decomposition process
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Redundant design, dual containment for safety priority
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In-line titrator provides batch process data
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CE and SEMI S2 3rd party certified
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COSTS - potential to turn a continuous expense into a revenue stream!
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Rapid Return-On-Investment (ROI) for customer