Chemical Waste Treatment

Feature Product: de-Peroxide - innovative removal of H2O2 in waste H2SO4

ARCADIA and our technology partner provides an enabling solution to wafer fabs. Our equipment, using our patented catalyst recipe, removes H2O2 content from 4-7% in waste H2SO4-H2O2 solution to less than 50ppm concentration. Our 5 and 10 CMD (cubic meters per day) equipment model has been successfully deployed in over 10 mass volume production wafer fabs.

Advantages:

Environmental green and friendly
de-H2O2 equipment meets and exceeds transportation regulation after reduction of H2O2 content
Reduce risk and cost in transporting untreated, explosive waste H2SO-H2O2 to reclaim / re-process facility
de-H2O2 equipment is low energy consumption (unlike distillation)
Small footprint
Capable of further diluting to desired H2SO4 concentration after reduction of H2O2 content
No Cl2 nor metallic contribution in decomposition process
Redundant design, dual containment for safety priority
In-line titrator provides batch process data
CE and SEMI S2 3rd party certified
COSTS - potential to turn a continuous expense into a revenue stream!
Rapid Return-On-Investment (ROI) for customer

de-Peroxide equipment main unit

de-Peroxide sub-modules

de-Peroxide equipment module layout

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